8e Colloque international sur les procédés plasma, 10-14 juin 1991, Antibes-Juan-Les-Pins, FranceLe Vide, les couches minces. 1991, Vol 47, Num 256, issn 0223-4335, SUPConference Proceedings

New trends in plasma etching and CVDHIROSE, M; SHIN, H; MIYAZAKI, S et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 105-112, issn 0223-4335, SUPConference Paper

Analysis of an ECR-plasmaNEUMANN, G; KNAPP, H.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 59-61, issn 0223-4335, SUPConference Paper

Surface profile simulation of etching and deposition processesMCVITIE, J. P; REY, J. C; ISLAMRAJA, M. M et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 24-28, issn 0223-4335, SUPConference Paper

Optical analysis of a CF₄ magnetron dischargeHEINRICH, F; HOFFMANN, P; MÜLLER, K. P et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 12-14, issn 0223-4335, SUPConference Paper

Plasma etching of Ti in fluorine containing feedsD'AGOSTINO, R; FRACASSI, F; PACIFICO, C et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 152-154, issn 0223-4335, SUPConference Paper

Plasma processes : special valves for CVD and etchingSELE, G; BOISSIN, S.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 401-403, issn 0223-4335, SUPConference Paper

Plasmachemical etching of aluminium evaluated from the pressure variationsZAHORAN, M; KOSINAR, I; MARTISOVITS, V et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 316-318, issn 0223-4335, SUPConference Paper

Thin film tri-electrode electroluminescent displayPORADA, Z. W.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 344-346, issn 0223-4335, SUPConference Paper

Microelectronics detox systemsPROUST, N.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 65-72, issn 0223-4335, SUPConference Paper

Diamond, graphite, and amorphous carbon depositionBEULENS, J. J; BUURON, A. J. M; OTORBAEV, D et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 329-331, issn 0223-4335, SUPConference Paper

Auger analysis of plasma etched narow and deep trenchesSAGNOL, PH; HALLALI, P. E.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 289-291, issn 0223-4335, SUPConference Paper

The method of near anode plasma mass-spectrometryPOZHAROV, S. L; MIRKARIMOV, A. M.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 384-386, issn 0223-4335, SUPConference Paper

Vapodeposition of Si₃N₄ layers using a new PECVD reactorFAKIH, C; BES, R. S; ARMAS, B et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 335-337, issn 0223-4335, SUPConference Paper

Dynamic large area plasma-CVD of dielectric coatingsGEGENWART, R; ARNOLD, M; BLANG, G et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 381-383, issn 0223-4335, SUPConference Paper

Active and passive spectroscopy in plasma deposition and plasma etchingSCHRAM, D. C.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 1-8, issn 0223-4335, SUPConference Paper

ECR etching of InP, GaAs and InGaAsP using CH₄/H₂BHARDWAJ, J. K; GUNN, R; WADE, I. T et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 98-100, issn 0223-4335, SUPConference Paper

In-situ ellipsometry during the reactive ion etching of SiGe alloysKROESEN, G. M. W; OEHRLEIN, G. S; DE FRESART, E et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 119-121, issn 0223-4335, SUPConference Paper

The decomposition of CF₂Cl₂ in mixtures with air induced by the negative coronaSOBEK, V; SKALNY, J. D; LUKAC, P et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 73-75, issn 0223-4335, SUPConference Paper

Thin films amorphous semiconductors for light and radiation detectionEQUER, B.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 192-200, issn 0223-4335, SUPConference Paper

Behaviour of polymer model surfaces in argon and oxygen plasmasSHI, M. K; HOLL, Y; CLOUET, F et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 250-252, issn 0223-4335, SUPConference Paper

Non-contact spacer and planarization control for CMOS technologyTEISSIER, J. F; ROTTINI, W; TISSIER, A et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 247-249, issn 0223-4335, SUPConference Paper

Plasma and surface characterization during reactive ion etching of tungstenPEIGNON, M. C; CARDINAUD, CH; TURBAN, G et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 295-297, issn 0223-4335, SUPConference Paper

Water vapour permeability and structure of plasma polymerized ethyleneTAKAHASHI, N; PELISSIER, V.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 356-358, issn 0223-4335, SUPConference Paper

Simulation of plasma processes with two-dimensional program TITANGERODOLLE, A; PELLETIER, J; TISSIER, A et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 283-285, issn 0223-4335, SUPConference Paper